Date of Award
8-2013
Document Type
Thesis
Degree Name
Master of Science (MS)
Legacy Department
Industrial Engineering
Committee Chair/Advisor
Mason, Scott J
Committee Member
Gramopadhye , Anand K
Committee Member
Kurz , Mary E
Abstract
Photolithography is typically the bottleneck process in semiconductor manufacturing. In this thesis, we present a model for optimizing photolithography job scheduling in the presence of both individual and cluster tools. The combination of individual and cluster tools that process various layers or stages of the semiconductor manufacturing process flow is a special type of flexible flowshop. We seek separately to minimize total weighted completion time and maximize on-time delivery performance. Experimental results suggest that our mathematical- and heuristic-based solution approaches show promise for real world implementation as they can help to improve resource utilization, reduce job completion times, and decrease unnecessary delays in a wafer fab.
Recommended Citation
Chalil madathil, Sreenath, "IMPROVED PHOTOLITHOGRAPHY SCHEDULING IN SEMICONDUCTOR MANUFACTURING" (2013). All Theses. 1703.
https://tigerprints.clemson.edu/all_theses/1703